Dual zone temperature control of upper electrodes
US9263240B2 · kind B2 · utility
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43References
10Claims
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Key dates
| Filing date | Mar 15, 2012 |
| Grant date | Feb 16, 2016 |
| Priority date | — |
| Expiry date | Nov 8, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method of plasma processing includes a plasma chamber including a substrate support and an upper electrode opposite the substrate support, the upper electrode having a plurality of concentric temperature control zones and a controller coupled to the plasma chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.