Toroidal plasma chamber for high gas flow rate process
US9275839B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 19, 2007 |
| Grant date | Mar 1, 2016 |
| Priority date | — |
| Expiry date | Aug 29, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.