3D memory having crystalline silicon NAND string channel
US9287290B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2015 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Feb 11, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B41/27
Abstract
Disclosed herein are 3D NAND memory devices having vertical NAND strings with a crystalline silicon channel and techniques for fabricating the same. The NAND string channel may be a single crystal of silicon or have a few large grains of polysilicon. The single crystal may have a (100) orientation with respect to a tunnel oxide of the 3D NAND string. When the channel region comprises grains of polysilicon, predominantly all of the silicon channel is part of a grain of polysilicon having the (100) orientation. The (100) orientation may be favorable for high carrier mobility. Techniques using metal induced crystallization (MIC) for forming the NAND strings having a crystalline silicon channel are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.