Johann Alsmeier
246Patents
47h-index
159Co-inventors
93Inventor score
Filing activity: Jun 30, 1994 → Jul 13, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9449987B1 | Three dimensional memory device with epitaxial semiconductor pedestal for peripheral transistors | Electricity | 391 | Active |
| US8187936B2 | Ultrahigh density vertical NAND memory device and method of making thereof | Electricity | 294 | Active |
| US8349681B2 | Ultrahigh density monolithic, three dimensional vertical NAND memory device | Electricity | 262 | Active |
| US9230973B2 | Methods of fabricating a three-dimensional non-volatile memory device | Electricity | 203 | Active |
| US9227456B2 | Memories with cylindrical read/write stacks | Physics | 181 | Active |
| US5627092A | Deep trench dram process on SOI for low leakage DRAM cell | Electricity | 175 | Expired |
| US8824183B2 | Non-volatile memory having 3D array of read/write elements with vertical bit lines and select devices and methods thereof | Electricity | 155 | Active |
| US8193054B2 | Ultrahigh density vertical NAND memory device and method of making thereof | Electricity | 146 | Active |
| US8198672B2 | Ultrahigh density vertical NAND memory device | Electricity | 141 | Active |
| US8658499B2 | Three dimensional NAND device and method of charge trap layer separation and floating gate formation in the NAND device | Electricity | 137 | Active |
| US9023719B2 | High aspect ratio memory hole channel contact formation | Electricity | 133 | Active |
| US8878278B2 | Compact three dimensional vertical NAND and method of making thereof | Electricity | 120 | Active |
| US8283228B2 | Method of making ultrahigh density vertical NAND memory device | Electricity | 118 | Active |
| US9530790B1 | Three-dimensional memory device containing CMOS devices over memory stack structures | Electricity | 108 | Active |
| US9230987B2 | Multilevel memory stack structure and methods of manufacturing the same | Electricity | 107 | Active |
| US8884357B2 | Vertical NAND and method of making thereof using sequential stack etching and landing pad | Electricity | 99 | Active |
| US8847302B2 | Vertical NAND device with low capacitance and silicided word lines | Electricity | 94 | Active |
| US10629616B1 | Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer | Electricity | 93 | Active |
| US8946023B2 | Method of making a vertical NAND device using sequential etching of multilayer stacks | Electricity | 87 | Active |
| US6235574A | High performance DRAM and method of manufacture | Electricity | 85 | Expired |
| US9502471B1 | Multi tier three-dimensional memory devices including vertically shared bit lines | Electricity | 83 | Active |
| US8445347B2 | 3D vertical NAND and method of making thereof by front and back side processing | Electricity | 81 | Active |
| US8614126B1 | Method of making a three-dimensional memory array with etch stop | Electricity | 77 | Active |
| US9576975B2 | Monolithic three-dimensional NAND strings and methods of fabrication thereof | Electricity | 72 | Active |
| US9570463B1 | Multilevel memory stack structure with joint electrode having a collar portion and methods for manufacturing the same | Electricity | 72 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.