Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US9301382B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2013 |
| Grant date | Mar 29, 2016 |
| Priority date | — |
| Expiry date | Dec 2, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.