Optical endpoint detection system
US9347132B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2012 |
| Grant date | May 24, 2016 |
| Priority date | — |
| Expiry date | Sep 14, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8416
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a processing system having an endpoint detection system may include a process chamber having internal surfaces requiring periodic cleaning due to processes performed in the process chamber; and an endpoint detection system that includes a light detector positioned to detect light reflected off of a first internal surface of the process chamber; and a controller coupled to the light detector and configured to determine an endpoint of a cleaning process based upon the detected reflected light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.