Lithographic apparatus and device manufacturing method
US9366972B2 · kind B2 · utility
Assignee
Inventors
- Joeri Lof
- Hans Butler
- Sjoerd Nicolaas Lambertus Donders
- Aleksey Yurievich Kolesnychenko
- Erik Roelof Loopstra
- Hendricus Johannes Maria Meijer
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Roelof Aeilko Siebrand Ritsema
- Frank Van Schaik
- Timotheus Franciscus Sengers
- Klaus Simon
- Joannes Theodoor De Smit
- Alexander Straaijer
- Helmar Van Santen
Key dates
| Filing date | Apr 30, 2015 |
| Grant date | Jun 14, 2016 |
| Priority date | — |
| Expiry date | Apr 30, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.