Patent · US Active

Method for synthesizing ultrahigh-purity silicon carbide

US9388509B2 · kind B2 · utility

0Cited by
13References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 26, 2013
Grant dateJul 12, 2016
Priority date
Expiry dateApr 12, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2982
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

In a method of forming polycrystalline SiC grain material, low-density, gas-permeable and vapor-permeable bulk carbon is positioned at a first location inside of a graphite crucible and a mixture of elemental silicon and elemental carbon is positioned at a second location inside of the graphite crucible. Thereafter, the mixture and the bulk carbon are heated to a first temperature below the melting point of the elemental Si to remove adsorbed gas, moisture and/or volatiles from the mixture and the bulk carbon. Next, the mixture and the bulk carbon are heated to a second temperature that causes the elemental Si and the elemental C to react forming as-synthesized SiC inside of the crucible. The as-synthesized SiC and the bulk carbon are then heated in a way to cause the as-synthesized SiC to sublime and produce vapors that migrate into, condense on and react with the bulk carbon forming polycrystalline SiC material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.