Patent · US Active

Control of electrolyte hydrodynamics for efficient mass transfer during electroplating

US9394620B2 · kind B2 · utility

13Cited by
100References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 18, 2014
Grant dateJul 19, 2016
Priority date
Expiry dateJun 18, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D21/10
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Described are apparatus and methods for electroplating one or more metals onto a substrate. Embodiments include electroplating apparatus configured for plating highly uniform metal layers. In specific embodiments, the apparatus includes a flow-shaping element made of an ionically resistive material and having a plurality of channels made through the flow shaping element. The channels allow for transport of the electrolyte through the flow shaping element during electroplating. The channel openings are arranged in a spiral-like pattern on the substrate-facing surface of the flow shaping element such that the center of the spiral-like pattern is offset from the center of the flow shaping element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.