Robert Rash
48Patents
13h-index
36Co-inventors
77Inventor score
Filing activity: Oct 30, 2007 → Mar 13, 2025
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD648289S1 | Electroplating flow shaping plate having offset spiral hole pattern | General | 47 | Expired |
| US7985325B2 | Closed contact electroplating cup assembly | Chemistry; Metallurgy | 27 | Active |
| US7935231B2 | Rapidly cleanable electroplating cup assembly | Chemistry; Metallurgy | 26 | Active |
| US8603305B2 | Electrolyte loop with pressure regulation for separated anode chamber of electroplating system | Chemistry; Metallurgy | 24 | Active |
| US8172992B2 | Wafer electroplating apparatus for reducing edge defects | Chemistry; Metallurgy | 21 | Active |
| US8377268B2 | Electroplating cup assembly | Chemistry; Metallurgy | 18 | Active |
| US9624592B2 | Cross flow manifold for electroplating apparatus | Electricity | 17 | Active |
| US8398831B2 | Rapidly cleanable electroplating cup seal | Chemistry; Metallurgy | 17 | Active |
| US8858774B2 | Electroplating apparatus for tailored uniformity profile | Electricity | 14 | Active |
| US9523155B2 | Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating | Chemistry; Metallurgy | 14 | Active |
| US9834852B2 | Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating | Chemistry; Metallurgy | 13 | Active |
| US9394620B2 | Control of electrolyte hydrodynamics for efficient mass transfer during electroplating | Chemistry; Metallurgy | 13 | Active |
| US9752248B2 | Methods and apparatuses for dynamically tunable wafer-edge electroplating | Chemistry; Metallurgy | 13 | Active |
| US9221081B1 | Automated cleaning of wafer plating assembly | Physics | 12 | Active |
| US8475637B2 | Electroplating apparatus with vented electrolyte manifold | Chemistry; Metallurgy | 11 | Active |
| US10094034B2 | Edge flow element for electroplating apparatus | Chemistry; Metallurgy | 10 | Active |
| US9260793B2 | Electroplating apparatus for tailored uniformity profile | Electricity | 10 | Active |
| US9455139B2 | Methods and apparatus for wetting pretreatment for through resist metal plating | Electricity | 9 | Active |
| US9567685B2 | Apparatus and method for dynamic control of plated uniformity with the use of remote electric current | Chemistry; Metallurgy | 9 | Active |
| US10190230B2 | Cross flow manifold for electroplating apparatus | Electricity | 6 | Active |
| US9139927B2 | Electrolyte loop with pressure regulation for separated anode chamber of electroplating system | Chemistry; Metallurgy | 6 | Active |
| US10066311B2 | Multi-contact lipseals and associated electroplating methods | Chemistry; Metallurgy | 5 | Active |
| US9721800B2 | Apparatus for wetting pretreatment for enhanced damascene metal filling | Electricity | 5 | Active |
| US10053793B2 | Integrated elastomeric lipseal and cup bottom for reducing wafer sticking | Electricity | 5 | Active |
| US10092933B2 | Methods and apparatuses for cleaning electroplating substrate holders | Electricity | 5 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.