Patent · US Active

Method of outgassing a mask material deposited over a workpiece in a process tool

US9412619B2 · kind B2 · utility

3Cited by
11References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 12, 2014
Grant dateAug 9, 2016
Priority date
Expiry dateDec 7, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/78
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Embodiments of the invention include methods and apparatuses for outgassing a workpiece prior to a plasma processing operation. An embodiment of the invention may comprise transferring a workpiece having a mask to an outgassing station that has one or more heating elements. The workpiece may then be heated to an outgassing temperature that causes moisture from the mask layer to be outgassed. After outgassing the workpiece, the workpiece may be transferred to a plasma processing chamber. In an additional embodiment, one or more outgassing stations may be located within a process tool that has a factory interface, a load lock coupled to the factory interface, a transfer chamber coupled to the load lock, and a plasma processing chamber coupled to the transfer chamber. According to an embodiment, an outgassing station may be located within any of the components of the process tool.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.