MOL architecture enabling ultra-regular cross couple
US9431300B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 2015 |
| Grant date | Aug 30, 2016 |
| Priority date | — |
| Expiry date | Aug 27, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/975
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming an ultra-regular layout with unidirectional M1 metal line and the resulting device are disclosed. Embodiments include forming first and second vertical gate lines, spaced from and parallel to each other; forming a M1 metal line parallel to and between the first and second gate lines; forming first, second, and third M0 metal segments perpendicular to the M1 metal line; connecting the first M0 metal segment to the M1 metal line and the second gate line; connecting the second M0 metal segment to the first gate line and the second gate line; connecting the third M0 metal segment to the first gate line and the M1 metal line; forming a first gate cut on the first gate line between the second and third M0 metal segments; and forming a second gate cut on the second gate line between the first and second M0 segments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.