Multi-channel gas-delivery system
US9441295B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 22, 2010 |
| Grant date | Sep 13, 2016 |
| Priority date | — |
| Expiry date | Sep 25, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/8158
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.