Patent · US Active

Transfer chamber gas purge apparatus, electronic device processing systems, and purge methods

US9441792B2 · kind B2 · utility

3Cited by

17References

18Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Edward Ng · Cambridge, US
Eric A. Englhardt · Palo Alto, US
Travis Morey · Austin, US
Ayan Majumdar · San Jose, US
Steve Hongkham · San Ramon, US

Key dates

Filing date	Sep 26, 2014
Grant date	Sep 13, 2016
Priority date	—
Expiry date	Oct 11, 2034

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T137/86292
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.