Patent · US Active

Electron beam plasma source with segmented suppression electrode for uniform plasma generation

US9443700B2 · kind B2 · utility

5Cited by

27References

14Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Leonid Dorf · San Jose, US
Shahid Rauf · Pleasanton, US
Kenneth S. Collins · San Jose, US
Nipun Misra · Berkeley, US
Kartik Ramaswamy · San Jose, US
James D. Carducci · Sunnyvale, US
Steven Lane · Porterville, US

Key dates

Filing date	Feb 10, 2014
Grant date	Sep 13, 2016
Priority date	—
Expiry date	Sep 10, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3233
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented suppression electrode with individually biased segments to control electron beam density distribution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.