Radical generator and molecular beam epitaxy apparatus
US9447518B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 24, 2011 |
| Grant date | Sep 20, 2016 |
| Priority date | — |
| Expiry date | Aug 18, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2465
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A radical generator includes a supply tube, a plasma-generating tube, a coil winding about an outer circumference of the plasma-generating tube, for generating an inductively coupled plasma in the plasma-generating tube, an electrode for generating a capacitively coupled plasma in the plasma-generating tube and adding the capacitively coupled plasma to the inductively coupled plasma, and a parasitic-plasma-preventing tube including a dielectric material which extends from a bottom of the plasma-generating tube to an opening of the supply tube in a space between the bottom and the opening, and a tip part thereof is inserted into the supply tube to cover an inner wall of the supply tube for preventing a generation of a parasitic plasma between the electrode and the inner wall of the supply tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.