Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna

US9449794B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Andrew Nguyen · San Jose, US
• Kartik Ramaswamy · San Jose, US
• Jason A. Kenney · Sunnyvale, US
• Shahid Rauf · Pleasanton, US
• Kenneth S. Collins · San Jose, US
• Yang Yang · San Diego, US
• Steven Lane · Porterville, US
• Yogananda Sarode Vishwanath · Kanchinakote, IN

Key dates

• Filing date: May 6, 2014
• Grant date: Sep 20, 2016
• Expiry date: Oct 4, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05H1/4652
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.