Plasma processing system including a symmetrical remote plasma source for minimal ion energy
US9449796B2 · kind B2 · utility
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4References
20Claims
0Family size
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Key dates
| Filing date | Oct 24, 2014 |
| Grant date | Sep 20, 2016 |
| Priority date | — |
| Expiry date | Jan 21, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/466
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A remote plasma source is enclosed by a pair of counter electrodes of conical or similar shape that are mirror images of one another and connected across a plasma power source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.