Ankur Agarwal
18Patents
4h-index
42Co-inventors
56Inventor score
Filing activity: Oct 3, 2005 → Sep 19, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8404598B2 | Synchronized radio frequency pulsing for plasma etching | Electricity | 69 | Active |
| US8382999B2 | Pulsed plasma high aspect ratio dielectric process | Electricity | 51 | Active |
| US8962488B2 | Synchronized radio frequency pulsing for plasma etching | Electricity | 23 | Active |
| US8974684B2 | Synchronous embedded radio frequency pulsing for plasma etching | Electricity | 12 | Active |
| US8980760B2 | Methods and apparatus for controlling plasma in a process chamber | Electricity | 4 | Active |
| US10790180B2 | Electrostatic chuck with variable pixelated magnetic field | Electricity | 3 | Active |
| US9896769B2 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Electricity | 3 | Active |
| US9745663B2 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Electricity | 3 | Active |
| US10131994B2 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Electricity | 2 | Active |
| US7704878B2 | Contact spacer formation using atomic layer deposition | Electricity | 2 | Active |
| US10460968B2 | Electrostatic chuck with variable pixelated magnetic field | Electricity | 1 | Active |
| US9362131B2 | Fast atomic layer etch process using an electron beam | Electricity | 1 | Active |
| US10573493B2 | Inductively coupled plasma apparatus | Electricity | 1 | Active |
| US9520294B2 | Atomic layer etch process using an electron beam | Electricity | 1 | Active |
| US9978606B2 | Methods for atomic level resolution and plasma processing control | Electricity | 0 | Active |
| US9449796B2 | Plasma processing system including a symmetrical remote plasma source for minimal ion energy | Electricity | 0 | Active |
| US10395896B2 | Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation | Electricity | 0 | Active |
| US8562742B2 | Apparatus for radial delivery of gas to a chamber and methods of use thereof | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.