Inventor · Sunnyvale, CA, US

Ajit Balakrishna

39Patents
11h-index
81Co-inventors
78Inventor score

Filing activity: Jul 8, 1999 → Aug 22, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US9741546B2 Symmetric plasma process chamber Electricity 365 Active
US6215106A Thermally processing a substrate Chemistry; Metallurgy 44 Expired
US10546728B2 Symmetric plasma process chamber Electricity 35 Active
US10580620B2 Symmetric plasma process chamber Electricity 33 Active
US10453656B2 Symmetric plasma process chamber Electricity 33 Active
US10535502B2 Symmetric plasma process chamber Electricity 32 Active
US8075728B2 Gas flow equalizer plate suitable for use in a substrate process chamber Electricity 20 Active
US7987814B2 Lower liner with integrated flow equalizer and improved conductance Emerging Cross-Sectional Technologies 18 Active
US8118938B2 Lower liner with integrated flow equalizer and improved conductance Emerging Cross-Sectional Technologies 17 Active
US6803546B1 Thermally processing a substrate Electricity 12 Expired
US7041931B2 Stepped reflector plate Electricity 11 Expired
US8282736B2 Lower liner with integrated flow equalizer and improved conductance Emerging Cross-Sectional Technologies 10 Active
US7967996B2 Process for wafer backside polymer removal and wafer front side photoresist removal Electricity 10 Active
US8329593B2 Method and apparatus for removing polymer from the wafer backside and edge Electricity 7 Active
US7552736B2 Process for wafer backside polymer removal with a ring of plasma under the wafer Electricity 6 Active
US8440019B2 Lower liner with integrated flow equalizer and improved conductance Emerging Cross-Sectional Technologies 5 Active
US7569463B2 Method of thermal processing structures formed on a substrate Electricity 5 Active
US7879183B2 Apparatus and method for front side protection during backside cleaning Performing Operations; Transporting 5 Active
US8980760B2 Methods and apparatus for controlling plasma in a process chamber Electricity 4 Active
US9896769B2 Inductively coupled plasma source with multiple dielectric windows and window-supporting structure Electricity 3 Active
US9761416B2 Apparatus and methods for reducing particles in semiconductor process chambers Emerging Cross-Sectional Technologies 3 Active
US9745663B2 Symmetrical inductively coupled plasma source with symmetrical flow chamber Electricity 3 Active
US9909213B2 Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors Electricity 2 Active
US10131994B2 Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow Electricity 2 Active
US9269546B2 Plasma reactor with electron beam plasma source having a uniform magnetic field Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.