Dual pulse driven extreme ultraviolet (EUV) radiation source method
US9451684B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2016 |
| Grant date | Sep 20, 2016 |
| Priority date | — |
| Expiry date | Mar 22, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0082
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet (EUV) radiation source pellet includes at least one metal particle embedded within a heavy noble gas cluster contained within a noble gas shell cluster. The EUV radiation source assembly can be activated by a sequential irradiation of at least one first laser pulse and at least one second laser pulse. Each first laser pulse generates plasma by detaching outer orbital electrons from the at least one metal particle and releasing the electrons into the heavy noble gas cluster. Each second laser pulse amplifies the plasma embedded in the heavy noble gas cluster triggering a laser-driven self-amplifying process. The amplified plasma induces inter-orbital electron transitions in heavy noble gas and other constitute atoms leading to emission of EUV radiation. The laser pulsing units can be combined with a source pellet generation unit to form an integrated EUV source system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.