Oleg Gluschenkov
255Patents
21h-index
235Co-inventors
93Inventor score
Filing activity: Jun 16, 2000 → Sep 23, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9799736B1 | High acceptor level doping in silicon germanium | Electricity | 398 | Active |
| US6977194B2 | Structure and method to improve channel mobility by gate electrode stress modification | Electricity | 180 | Expired |
| US7198995B2 | Strained finFETs and method of manufacture | Electricity | 142 | Expired |
| US6891192B2 | Structure and method of making strained semiconductor CMOS transistors having lattice-mismatched semiconductor regions underlying source and drain regions | Electricity | 114 | Expired |
| US8217423B2 | Structure and method for mobility enhanced MOSFETs with unalloyed silicide | Electricity | 98 | Active |
| US7247534B2 | Silicon device on Si:C-OI and SGOI and method of manufacture | Electricity | 90 | Expired |
| US7015082B2 | High mobility CMOS circuits | Electricity | 88 | Expired |
| US6930060B2 | Method for forming a uniform distribution of nitrogen in silicon oxynitride gate dielectric | Electricity | 76 | Expired |
| US6720630B2 | Structure and method for MOSFET with metallic gate electrode | Emerging Cross-Sectional Technologies | 69 | Expired |
| US7247547B2 | Method of fabricating a field effect transistor having improved junctions | Electricity | 50 | Expired |
| US7279413B2 | High-temperature stable gate structure with metallic electrode | Electricity | 46 | Expired |
| US7138685B2 | Vertical MOSFET SRAM cell | Electricity | 43 | Expired |
| US7030012B2 | Method for manufacturing tungsten/polysilicon word line structure in vertical DRAM | Electricity | 37 | Expired |
| US6451662B1 | Method of forming low-leakage on-chip capacitor | Electricity | 35 | Expired |
| US9773901B1 | Bottom spacer formation for vertical transistor | Electricity | 29 | Active |
| US7084024B2 | Gate electrode forming methods using conductive hard mask | Electricity | 28 | Expired |
| US7002209B2 | MOSFET structure with high mechanical stress in the channel | Electricity | 26 | Expired |
| US6358867B1 | Orientation independent oxidation of silicon | Emerging Cross-Sectional Technologies | 22 | Expired |
| US6444516B1 | Semi-insulating diffusion barrier for low-resistivity gate conductors | Electricity | 22 | Expired |
| US7585704B2 | Method of producing highly strained PECVD silicon nitride thin films at low temperature | Electricity | 22 | Expired |
| US6544874B2 | Method for forming junction on insulator (JOI) structure | Electricity | 22 | Expired |
| US8237278B2 | Configurable interposer | Emerging Cross-Sectional Technologies | 19 | Active |
| US6982196B2 | Oxidation method for altering a film structure and CMOS transistor structure formed therewith | Electricity | 19 | Expired |
| US7504700B2 | Method of forming an ultra-thin [[HfSiO]] metal silicate film for high performance CMOS applications and semiconductor structure formed in said method | Electricity | 18 | Expired |
| US6806534B2 | Damascene method for improved MOS transistor | Electricity | 18 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.