Patent · US Active

Reflective optical element

US9470872B2 · kind B2 · utility

1Cited by

2References

21Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Boris Bittner · Roth, DE
Norbert Wabra · Werneck, DE
Sonja Schneider · Lehrberg, DE
Ricarda Schneider · Zusmarshausen, DE
Hendrik Wagner · Bielefeld, DE
Rumen Iliew · Oberkochen, DE
Walter Pauls · Wertingen, DE

Key dates

Filing date	Oct 30, 2014
Grant date	Oct 18, 2016
Priority date	—
Expiry date	Feb 28, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A reflective optical element for a microlithographic projection exposure apparatus, a mask inspection apparatus or the like. The reflective optical element has an optically effective surface, an element substrate (12, 32, 42, 52), a reflection layer system (14, 34, 44, 54) and at least one deformation reduction layer (15, 35, 45, 55, 58). When the optically effective surface (11, 31, 41, 51) is irradiated with electromagnetic radiation, a maximum deformation level of the reflection layer system is reduced in comparison with a deformation level of an analogously constructed reflective optical element without the deformation reduction layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.