Patent · US Active

Surface annealing of components for substrate processing chambers

US9481608B2 · kind B2 · utility

4Cited by

325References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ashish Bhatnagar · Fremont, US
Laxman Murugesh · Fremont, US
Padma Gopalakrishnan · Fremont, US

Key dates

Filing date	Nov 22, 2013
Grant date	Nov 1, 2016
Priority date	—
Expiry date	May 29, 2035

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/131
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.