Lithographic apparatus and device manufacturing method
US9482966B2 · kind B2 · utility
Assignee
Inventors
- Joeri Lof
- Erik Theodorus Maria Bijlaart
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Erik Roelof Loopstra
- Hendricus Johannes Maria Meijer
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Roelof Aeilko Siebrand Ritsema
- Timotheus Franciscus Sengers
- Klaus Simon
- Joannes Theodoor De Smit
- Alexander Straaijer
- Bob Streefkerk
Key dates
| Filing date | Sep 13, 2012 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Feb 15, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.