Lithographic apparatus, control system and device manufacturing method
US9482967B2 · kind B2 · utility
2Cited by
21References
21Claims
0Family size
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Key dates
| Filing date | Sep 21, 2011 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Aug 13, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.