Apparatus and method for optical inspection, magnetic field and height mapping
US9513230B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2013 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | Aug 21, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N7/18
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.