Lithographic apparatus and method
US9519224B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2012 |
| Grant date | Dec 13, 2016 |
| Priority date | — |
| Expiry date | Mar 2, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7084
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto a target portion of the substrate, wherein the support structure is provided with a grating comprising a series of first reflective portions which alternates with a series of second reflective portions, the second reflective portions having a reflectivity which is less than the reflectivity of at least part of the first reflective portions and which is greater than zero.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.