Patent · US Active

Method and apparatus for assisted metal routing

US9519745B2 · kind B2 · utility

5Cited by
0References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 24, 2014
Grant dateDec 13, 2016
Priority date
Expiry dateOct 24, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F30/394
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method and apparatus for an assisted metal routing is disclosed. Embodiments may include: determining an initial block mask having a first inner vertex for forming a metal routing layer of an integrated circuit (IC); adding an assistant metal portion within the metal routing layer; and determining a modified block mask based on the assistant metal portion for forming the metal routing layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.