Dual-mask arrangement for solar cell fabrication
US9525099B2 · kind B2 · utility
5Cited by
25References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2013 |
| Grant date | Dec 20, 2016 |
| Priority date | — |
| Expiry date | May 8, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An arrangement for supporting substrates during processing, having a wafer carrier with a susceptor for supporting the substrate and confining the substrate to predetermined position. An inner mask is configured for placing on top of the substrate, the inner mask having an opening pattern to mask unprocessed parts of the substrate, but expose remaining parts of the substrate for processing. An outer mask is configured for placing on top of the inner mask, the outer mask having an opening that exposes the part of the inner mask having the opening pattern, but cover the periphery of the inner mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.