Patent · US Active

Focusing a charged particle system

US9530613B2 · kind B2 · utility

22Cited by

4References

20Claims

0Family size

Assignees

Applied Materials Israel Ltd. · IL
Carl Zeiss Microscopy GmbH · DE

Inventors

Steven R. Rogers · Ashdod, IL
Rainer Knippelmeyer · Utting am Ammersee, DE
Thomas Kemen · Meppen, DE
Stefan Schubert · Oberkochen, DE
Nissim Elmaliah · Raanana, IL

Key dates

Filing date	Feb 17, 2012
Grant date	Dec 27, 2016
Priority date	—
Expiry date	Jan 16, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.