Apparatus for providing and directing heat energy in a process chamber

US9543172B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Joseph R. Johnson · Palo Alto, US
• Joseph M. Ranish · San Jose, US
• John E. Gerling · Cupertino, US
• Mathew Abraham · San Diego, US
• Aaron Muir Hunter · Santa Cruz, US
• Aneesh Nainani · Palo Alto, US

Key dates

• Filing date: Oct 1, 2013
• Grant date: Jan 10, 2017
• Expiry date: Jul 13, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67109
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Apparatus for providing heat energy to a process chamber are provided herein. The apparatus may include a process chamber body of the process chamber, a solid state source array having a plurality of solid state sources, disposed on a first substrate, to provide heat energy to the process chamber to heat a target component disposed in the process chamber body, and at least one reflector disposed on the first substrate proximate to one or more of the plurality of solid state sources to direct heat energy provided by the one or more of the plurality of solid state sources towards the target component.