Patent · US Active

Electron beam plasma source with remote radical source

US9564297B2 · kind B2 · utility

6Cited by

13References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ming-Feng Wu · Tainan, TW
Leonid Dorf · San Jose, US
Shahid Rauf · Pleasanton, US
Ying Zhang · Santa Clara, US
Kenneth S. Collins · San Jose, US
Hamid Tavassoli · Cupertino, US
Kartik Ramaswamy · San Jose, US
Steven Lane · Porterville, US

Key dates

Filing date	Jun 18, 2014
Grant date	Feb 7, 2017
Priority date	—
Expiry date	Mar 24, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32458
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and a remote radical source is incorporated with the process chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.