Patent · US Active

Method of fabricating a polishing

US9597770B2 · kind B2 · utility

0Cited by
7References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 21, 2014
Grant dateMar 21, 2017
Priority date
Expiry dateMar 24, 2035

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24D18/0009
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Polishing pads with apertures are described. Methods of fabricating polishing pads with apertures are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.