Estimation of spectral feature of pulsed light beam
US9599510B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 17, 2014 |
| Grant date | Mar 21, 2017 |
| Priority date | — |
| Expiry date | Mar 4, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2003/2853
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus. The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.