Lithographic apparatus and method of manufacturing a device
US9606445B2 · kind B2 · utility
3Cited by
0References
21Claims
0Family size
Assignee
Inventors
- Vadim Yevgenyevich Banine
- Arthur Winfried Eduardus Minnaert
- Marcel Johannus Elisabeth Hubertus Muitjens
- Andrei Mikhailovich Yakunin
- Luigi Scaccabarozzi
- Hans Joerg Mallmann
- Kurstat Bal
- Carlo Cornelis Maria Luijten
- Han-Kwang Nienhuys
- Alexander Marinus Arnoldus Huijberts
- Paulus Albertus Maria Gasseling
- Pedro Julian Rizo Diago
- Maarten Van Kampen
- Nicolaas Aldegonda Jan Maria Van Aerle
Key dates
| Filing date | Jul 30, 2013 |
| Grant date | Mar 28, 2017 |
| Priority date | — |
| Expiry date | Nov 23, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.