Triple patterning NAND flash memory
US9613806B2 · kind B2 · utility
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11References
16Claims
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Key dates
| Filing date | Sep 4, 2013 |
| Grant date | Apr 4, 2017 |
| Priority date | — |
| Expiry date | Feb 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B41/35
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A NAND flash memory array is initially patterned by forming a plurality of sidewall spacers according along sides of patterned portions of material. The pattern of sidewall spacers is then used to form a second pattern of hard mask portions including first hard mask portions defined on both sides by sidewall spacers and second hard mask portions defined on only one side by sidewall spacers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.