Patent · US Active

Method for processing a carrier, a carrier, an electronic device and a lithographic mask

US9613812B2 · kind B2 · utility

0Cited by

0References

11Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Jens Schneider · Bielefeld, DE
Henning Feick · Dresden, DE
Marcel Heller · Neustadt in Sachsen, DE
Dieter Kaiser · Dortmund, DE

Key dates

Filing date	Apr 23, 2015
Grant date	Apr 4, 2017
Priority date	—
Expiry date	Jul 13, 2035

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24802
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Various embodiments provide a method for processing a carrier, the method including changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask layer regions are formed having different mask layer thicknesses; and applying an ion implantation process to the at least two mask layer regions to form at least two implanted regions in the carrier having different implantation depth profiles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.