Inspecting high-resolution photolithography masks
US9619878B2 · kind B2 · utility
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Key dates
| Filing date | Apr 11, 2014 |
| Grant date | Apr 11, 2017 |
| Priority date | — |
| Expiry date | Jun 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.