Stanley Stokowski
41Patents
15h-index
42Co-inventors
81Inventor score
Filing activity: Dec 10, 1976 → Oct 29, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6201601A | Sample inspection system | Physics | 232 | Expired |
| US5883710A | Scanning system for inspecting anomalies on surfaces | Physics | 118 | Expired |
| US5076692A | Particle detection on a patterned or bare wafer surface | Physics | 113 | Expired |
| US6608676B1 | System for detecting anomalies and/or features of a surface | Physics | 110 | Expired |
| US6215551A | Scanning system for inspecting anomalies on surfaces | Physics | 92 | Expired |
| US6639662B2 | Sample inspection system | Physics | 46 | Expired |
| US5241366A | Thin film thickness monitor | Physics | 43 | Expired |
| US6384910B2 | Sample inspection system | Physics | 32 | Expired |
| US4824598A | Synthetic laser medium | Chemistry; Metallurgy | 31 | Expired |
| US7088443B2 | System for detecting anomalies and/or features of a surface | Physics | 24 | Expired |
| US8711346B2 | Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks | Physics | 20 | Active |
| US4060729A | Pyroelectric detector with decreased susceptibility to vibrational noise | Electricity | 19 | Expired |
| US6956644B2 | Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination | Electricity | 18 | Expired |
| US6674522B2 | Efficient phase defect detection system and method | Physics | 16 | Expired |
| US6636302B2 | Scanning system for inspecting anamolies on surfaces | Physics | 15 | Expired |
| US6657715B2 | Sample inspection system | Physics | 15 | Expired |
| US6618134B2 | Sample inspection system | Physics | 15 | Expired |
| US7297453B2 | Systems and methods for mitigating variances on a patterned wafer using a prediction model | Emerging Cross-Sectional Technologies | 14 | Expired |
| US7303842B2 | Systems and methods for modifying a reticle's optical properties | Emerging Cross-Sectional Technologies | 14 | Expired |
| US7564545B2 | Inspection methods and systems for lithographic masks | Physics | 14 | Active |
| US4661284A | Silica and boron-containing ultraphosphate laser glass with low concentration quenching and improved thermal shock resistance | Emerging Cross-Sectional Technologies | 13 | Expired |
| US4998019A | Photoemission contaminant detector | Physics | 12 | Expired |
| US7119897B2 | Sample inspection system | Physics | 11 | Expired |
| US5140609A | TRD temperature sensor | Emerging Cross-Sectional Technologies | 10 | Expired |
| US8785082B2 | Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality | Physics | 10 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.