Fred E. Stanke
45Patents
18h-index
40Co-inventors
81Inventor score
Filing activity: Jun 15, 1989 → Feb 20, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6819426B2 | Overlay alignment metrology using diffraction gratings | Electricity | 229 | Expired |
| US5717169A | Method and apparatus for inspecting well bore casing | Physics | 129 | Expired |
| US6753961B1 | Spectroscopic ellipsometer without rotating components | Physics | 72 | Expired |
| US6768967B2 | Database interpolation method for optical measurement of diffractive microstructures | Physics | 65 | Expired |
| US6340602B1 | Method of measuring meso-scale structures on wafers | Electricity | 59 | Expired |
| US6690473B1 | Integrated surface metrology | Electricity | 49 | Expired |
| US5996415A | Apparatus and method for characterizing semiconductor wafers during processing | Physics | 47 | Expired |
| US7042569B2 | Overlay alignment metrology using diffraction gratings | Electricity | 46 | Expired |
| US6623991B2 | Method of measuring meso-scale structures on wafers | Electricity | 40 | Expired |
| US4928269A | Determining impedance of material behind a casing in a borehole | Physics | 40 | Expired |
| US6806105B2 | Method of measuring meso-scale structures on wafers | Electricity | 35 | Expired |
| US6182510A | Apparatus and method for characterizing semiconductor wafers during processing | Physics | 30 | Expired |
| US5859811A | Method of analyzing waveforms | Physics | 28 | Expired |
| US6778273B2 | Polarimetric scatterometer for critical dimension measurements of periodic structures | Physics | 27 | Expired |
| US6018496A | Method and apparatus for hydraulic isolation determination | Physics | 26 | Expired |
| US6563586B1 | Wafer metrology apparatus and method | Electricity | 25 | Expired |
| US6829054B2 | Integrated surface metrology | Electricity | 24 | Expired |
| US5274604A | Method for spatially filtering signals representing formation and channel echoes in a borehole environment | Physics | 23 | Expired |
| US6188643A | Method and apparatus for inspecting well bore casing | Physics | 17 | Expired |
| US6112595A | Apparatus and method for characterizing semiconductor wafers during processing | Physics | 15 | Expired |
| US6019000A | In-situ measurement of deposition on reactor chamber members | Physics | 13 | Expired |
| US9165742B1 | Inspection site preparation | Electricity | 11 | Active |
| US7289219B2 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures | Physics | 8 | Expired |
| US6667805B2 | Small-spot spectrometry instrument with reduced polarization | Physics | 7 | Expired |
| US6909507B2 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures | Physics | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.