System and method for apodization in a semiconductor device inspection system
US9645093B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2015 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Nov 2, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8825
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.