Multiple threshold convergent OPC model
US9645486B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2014 |
| Grant date | May 9, 2017 |
| Priority date | — |
| Expiry date | Jun 5, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of calibrating an OPC model using converged results of CD measurements from at least two locations along a substrate profile of a 1D, 2D, or critical area structure are provided. Embodiments include calibrating an OPC model for a structure to be formed in a substrate; simulating a CD of the structure at at least two locations along a substrate profile of the structure using the OPC model; comparing the simulated CD of the structure at each location against a corresponding measured CD; recalibrating the OPC model based on the comparing of each simulated CD against the corresponding measured CD; repeating the steps of simulating, comparing, and recalibrating until comparing at a first of the at least two locations converges to a first criteria and comparing at each other of the at least two locations converges to a corresponding criteria; and forming the structure using the recalibrated OPC model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.