Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures
US9653307B1 · kind B1 · utility
17Cited by
9References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2016 |
| Grant date | May 16, 2017 |
| Priority date | — |
| Expiry date | Jul 14, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/321
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A surface modification composition comprising a silylation agent comprising a silyl acetamide, a silylation catalyst comprising a perfluoro acid anhydride, an amine-based complexing agent, and an organic solvent. Methods of modifying a silicon-based material and methods of forming high aspect ratio structures on a substrate are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.