Device for measuring point diffraction interferometric wavefront aberration and method for detecting wave aberration

US9658114B1 · kind B1 · utility

Assignee

• Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

• Feng Tang · Geneva, US
• Xiangzhao Wang · Shanghai, CN
• Peng Feng · Hefei, CN
• Fudong Guo · Shanghai, CN
• Yunjun Lu · Shanghai, CN

Key dates

• Filing date: Dec 31, 2015
• Grant date: May 23, 2017
• Expiry date: Dec 31, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G01J2009/0261
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A device for measuring point diffraction interferometric wavefront aberration having an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. A method for detecting wavefront aberration of the optical system by using the device is also disclosed.