Method and apparatus for precleaning a substrate surface prior to epitaxial growth
US9683308B2 · kind B2 · utility
6Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2014 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | Nov 4, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.