Developing method, developing apparatus and storage medium
US9690202B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2015 |
| Grant date | Jun 27, 2017 |
| Priority date | — |
| Expiry date | Sep 4, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A developing method includes: forming a puddle of a developer on a surface of the substrate held by the substrate holding unit by a first developer nozzle; subsequently spreading the puddle of the developer over the whole substrate surface, by moving the first developer nozzle discharging the developer from a central or peripheral part to the peripheral or central part of the rotating substrate, with a contacting part of the first developer nozzle contacting with the puddle; supplying the developer from a second developer nozzle onto the rotating substrate, thereby to uniformize, in the substrate plane, distribution of a degree of progress of development by the developer spreading step; and removing the developer between the developer spreading step and the developer supplying step to remove the developer on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.