High conductivity electrostatic chuck
US9692325B2 · kind B2 · utility
5Cited by
7References
25Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Sep 8, 2011 |
| Grant date | Jun 27, 2017 |
| Priority date | — |
| Expiry date | Feb 19, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6833
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 108 to about 1012 ohms per square.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.