Patent · US Active

Electron beam plasma source with reduced metal contamination

US9721760B2 · kind B2 · utility

0Cited by

13References

7Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Leonid Dorf · San Jose, US
Shahid Rauf · Pleasanton, US
Kenneth S. Collins · San Jose, US
Kartik Ramaswamy · San Jose, US
Nipun Misra · Berkeley, US
Gonzalo Monroy · San Francisco, US
James D. Carducci · Sunnyvale, US
Steven Lane · Porterville, US

Key dates

Filing date	Jun 7, 2013
Grant date	Aug 1, 2017
Priority date	—
Expiry date	Jul 13, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/50
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.