Microlithographic projection exposure apparatus

US9733395B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Vladimir Kamenov · Oberkochen, DE
• Daniel Kraehmer · Aalen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Karl-Stefan Weissenrieder · Langenau, DE
• Heiko Feldmann · Aalen, DE
• Achim Zirkel · Munich, DE
• Alexandra Pazidis · Aalen, DE
• Bruno Thome · Aalen, DE
• Stephan Six · Aalen, DE

Key dates

• Filing date: May 20, 2011
• Grant date: Aug 15, 2017
• Expiry date: Mar 19, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70958
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.